IRP14
Location
Grenoble, France
Host institution
NELLOW is a company targeting the market of microelectronic chips for logic operations and AI, thanks to the invention of a new type of component with ultra-low energy consumption: the FESO device. Protected by a portfolio of 12 patents, FESO results from 15 years of collaboration between world-leading research institutions in new microelectronic solutions (CEA, UGA, CNRS). This technology has the potential to become the global solution for computing and AI. In 2020, NELLOW founders contributed to the discovery of a remarkable new physical effect led to the invention of this technology. The FESO device combines spintronics with ferroelectricity, using quantum materials (2D electron gases in oxides) and ferroelectric semiconductors.
Supervisor
Dr. Laurent Vila
Description
Ferroelectric materials allow the design of ultra-low power devices, thanks to the non-volatile nature of the ferroic order and its control with a pure voltage-based switching at the lowest switching energy possible. This ferroic order has a direct imprint into the orbital and spin texture of Rashba states appearing at their surface. The use of semiconductors rather than metals allows the harnessing of enlarged orbital current and their ferroelectric control. This opens a route to enhance the output voltage of FESO devices currently developed by NELLOW. Nanodevices will be fabricated using advanced lithography techniques, to allow an efficient spin/orbital injection and the control of the orbital-to-charge conversion through the ferroelectric state. Care will be taken at the interface quality between the ferroelectric material and the spin injection layer to avoid interdiffusion and spin back flow. The device will be characterized by magnetotransport experiments, and the signal will be modelled using finite element simulation of the spin drift transport equation, including the formalism of Rashba interconversion mechanism.
Requirements
Master’s degree in physics, condensed matter, nanotechnologies or materials sciences
Planned Secondments
- Academic secondment at ETH Zürich, under the supervision of Pietro Gambardella
- Academic secondment at CIC nanoGUNE, under the supervision of Luis Hueso
Planned Secondments
Academic Secondment
ETH Zürich
Zürich, Switzerland
Pietro Gambardella
Academic Secondment
CIC nanoGUNE
Donostia - San Sebastián, Spain
Luis Hueso
Registering University
Université Grenoble-Alpes
